Nanoimprint lithography for the development of multifunctional surfaces at IMDEA Nanociencia

Place: conference room, IMDEA Nanociencia.

Abstract:

Nanoimprint lithography (NIL) is a highly versatile nanomanufacturing technique that offers nanometric resolution, simplicity in operation, and high throughput. Over the years, NIL has become a key enabling technology, employed across a wide range of research fields, from biotechnology to photonics, for the development of functional nanostructured surfaces. In this seminar, Dr. Hernández will provide an overview of the NIL process, highlighting its broad applicability and key advantages. Examples of multifunctional surfaces based on polymers and polymer nanocomposites, developed at IMDEA Nanoscience, will be presented. These include fabrication at both the wafer scale, using the Nanofabrication Center’s facilities, and at large scale, employing the roll-to-roll pilot plant.